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Some Investigations on the Anisotropy of the Chemical Etching of (h k 0) and (h h I) Silicon Plates in a NaOH 35% Solution. Part III: Determination of a Database for the Simulator Tensosim and Prediction of 2D Etching Shapes
Silicon Anisotropic etching NaOH etchant Tensorial and kinematic model Simulator TENSOSIM
2010/12/7
The simulation of 2D etching shapes such as surface profiles and out-of-roundness profiles related to various (h k 0) and (h h l) silicon plates or cross-sections is studied. The theoretical basis of ...
Some Investigations on the Anisotropy of the Chemical Etching of (h k 0) and (h h l) Silicon Plates in a NaOH 35% Solution. Part II: 3D Etching Shapes, Analysis and Comparison with KOH 56%
the Chemical Etching (h k 0) and (h h l) Silicon Plates a NaOH 35% Solution KOH 56%
2010/12/8
This paper deals with the micromachining of various (h k 0) and (h h l) membrane–mesa structures in a NaOH 35% solution. Final etching shapes of micromachined structures show a marked anisotropy of ty...
Some Investigations on the Anisotropy of the Chemical Etching of (hk0) and (hhl) Silicon Plates in a NaOH 35% Solution. Part I: 2D Etching Shapes
Anisotropic etching Silicon NaoH etchant
2010/12/8
In this paper a study of the anisotropic dissolution of (hk0) and (hhl) silicon plates in a NaOH 35% solution is undertaken. Effects of orientation on firstly, the geometrical features of etched surfa...